Header Ads

Breaking News
recent

Fed Poly Nasarawa Admission Screening 2017: Eligibility & Registration Details

Fed Poly Nasarawa Admission Screening 2017: Eligibility & Registration Details

Applications are invited from suitably qualified candidates for admission into ND full time programmes run by the Polytechnic in the 2017/2018 Academic Session. 

Eligibility Candidates that have chosen the Federal Polytechnic, Nasarawa in the 2017 UTME and scored the approved minimum cut-off points in the appropriate subjects combination are eligible for post-UTME Screening. 

Available Programmes 

School of Engineering Technology 
Electrical/Electronics Engineering Technology with options: 
Power and Machines 
Electronics and Telecommunication 
Mechanical Engineering Technology with option in Manufacturing 
Agricultural Engineering Technology with options in: 
Farm Power 
Post Harvest 

School of Applied Sciences 
Statistics Science Laboratory Technology with options in:
 Applied Chemistry 
Physics Electronics 
Biochemistry 
Microbiology 

School of Information and Technology 
Computer Science
 Office Technology and Management 
School of Environmental Studies
 Architectural Technology Building Technology
 Quantity Surveying 
Urban and Regional Planning
 Estate Management 

School of Business studies
 Accountancy 
Business Administration and Management. 
Banking and Finance 
Marketing

 Method of Application 
Application forms are obtainable on successful payments on the Remita platform. 
Applicants may use their debit cards (Interswitch, Verve, Mastercard etc) or make cash payments at the bank to get an RRR-code to be used on the platform. 

A non-refundable fee is required as follows: ND (Post UTME) 2,500 Candidates are to then proceed to begin their application process via this link: http://fedpolynasarawa.edu.ng/registration/application-steps/ Application Deadline The deadline for submission of applications is Monday July 31st, 2017.

No comments:

share your thoughts with us

Theme images by i-bob. Powered by Blogger.